Low temperature growth of highly crystallized silicon thin films using hydrogen and argon dilution
- 1 May 1998
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 227-230, 852-856
- https://doi.org/10.1016/s0022-3093(98)00342-1
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
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