Thin film sputter deposition for hybrid applications
- 1 January 1990
- Vol. 41 (4) , 1400-1402
- https://doi.org/10.1016/0042-207x(90)93969-p
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Internal stresses in Cr, Mo, Ta, and Pt films deposited by sputtering from a planar magnetron sourceJournal of Vacuum Science and Technology, 1982
- High Rate Thick Film GrowthAnnual Review of Materials Science, 1977