Practical results of EL2

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Abstract
Samples of resist images and device structures are presented, which demonstrate system performance aspects of pattern image fidelity and overlay accuracy of the variable-shape spot (VSS) lithography tool EL2. Test pattern exposure giving qualitative, but more comprehensive information about image fidelity, are compared to quantitative results of resolution measurements with the knife-edge scanning technique. The preeminent resolution limiting electron-optical aberrations determined by complex electron–electron interactions, are explained and put in perspective. Several EL2 systems have been equipped with VSS columns tailored to applications ranging from submicron lithography to 2 μm minimum images over fields of deflection up to 8×8 mm2. Images obtained in test patterns correspond to 10 000 fabricated lines per field. It is shown how the pattern overlay accuracy is determined. The results quoted satisfy technology requirements within an error level of three times the standard deviation.

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