A homogeneous gas phase mechanism for use in a regional acid deposition model
- 1 January 1986
- journal article
- research article
- Published by Elsevier in Atmospheric Environment (1967)
- Vol. 20 (8) , 1615-1632
- https://doi.org/10.1016/0004-6981(86)90251-9
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Comparative analysis of chemical reaction mechanisms for photochemical smogAtmospheric Environment (1967), 1985
- Primary quantum yields of photodecomposition of acetone in air under tropospheric conditionsThe Journal of Physical Chemistry, 1984
- The decoupled direct method for calculating sensitivity coefficients in chemical kineticsThe Journal of Chemical Physics, 1984
- Evaluation of Kinetic and Mechanistic Data for Modeling of Photochemical SmogJournal of Physical and Chemical Reference Data, 1984
- Analysis of the characteristics of complex chemical reaction mechanisms. Application to photochemical smog chemistryEnvironmental Science & Technology, 1984
- Acid generation in the troposphere by gas-phase chemistryEnvironmental Science & Technology, 1983
- Deviations from the O3–NO–NO2 photostationary state in tropospheric chemistryCanadian Journal of Chemistry, 1983
- Experimental investigation of chamber‐dependent radical sourcesInternational Journal of Chemical Kinetics, 1982
- Formaldehyde and other carbonyls in Los Angeles ambient airEnvironmental Science & Technology, 1982
- An updated chemical mechanism for hydrocarbon/NOx/SO2 photooxidations suitable for inclusion in atmospheric simulation modelsAtmospheric Environment (1967), 1982