The chemical vapor deposition of boron at low temperatures
- 1 September 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 83 (1) , 87-92
- https://doi.org/10.1016/0040-6090(81)90590-3
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Boron compound protective coatings prepared by means of low pressure plasma CVDJournal of Nuclear Materials, 1979
- Boriding with a thermally unstable gas (diborane)Metallurgical Transactions A, 1979
- Boron coatings on graphite for fusion reactor applicationsThin Solid Films, 1979
- Low-pressure chemical vapor deposition for very large-scale integration processing—A reviewIEEE Transactions on Electron Devices, 1979