Micropatterned multilayer dielectric filters with two spectral characteristics
- 1 April 1997
- journal article
- Published by SPIE-Intl Soc Optical Eng in Optical Engineering
- Vol. 36 (4) , 1220-1224
- https://doi.org/10.1117/1.601241
Abstract
Micropatterned interference filters are developed by dry etching of dielectric multilayer stacks. The application of reactive-ion etching (RIE) techniques combined with the use of an etchstop layer are shown to be quite effective in producing two-stage micropatterns with defined spectral properties. By using a MgF2 underlayer the etching of TiO2 and SiO2 layers is stopped exactly, which provides the possibility to develop large area patterns (>1×1 cm2) with feature sizes as small as 10 μm. The distortion of edge features is shown to be better than 1 μm. A filter array was developed providing high-reflection and antireflection coatings within a period of 20 μm. © 1997 Society of Photo-Optical Instrumentation Engineers.Keywords
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