p-i-n junction in the anodic oxide film of tantalum
- 1 June 1960
- journal article
- Published by Elsevier in Journal of Physics and Chemistry of Solids
- Vol. 13 (3-4) , 177-186
- https://doi.org/10.1016/0022-3697(60)90001-9
Abstract
No abstract availableKeywords
This publication has 28 references indexed in Scilit:
- Structure and Characteristics of Silicon Carbide Light-Emitting JunctionsJournal of Applied Physics, 1957
- Nucleation of Crystalline Ta[sub 2]O[sub 5] During Field CrystallizationJournal of the Electrochemical Society, 1957
- Effect of Ultraviolet Irradiation on the Growth of Anodic Ta[sub 2]O[sub 5] FilmsJournal of the Electrochemical Society, 1957
- The Crystallization of Anodic Tantalum Oxide Films in the Presence of a Strong Electric FieldJournal of the Electrochemical Society, 1955
- Anodic oxide films. Part 4.—The interpretation of impedance measurements on oxide coated electrodes on niobiumTransactions of the Faraday Society, 1955
- Formation of Anodic Oxide Films on CathodesJournal of the Electrochemical Society, 1954
- The Mechanism of Electrolytic RectificationJournal of the Electrochemical Society, 1952
- Transition of an Oxide-Coated CathodePhysical Review B, 1951
- Lichtelektrische Untersuchungen an elektrolytisch hergestellten dünnen Ta-OxydschichtenThe European Physical Journal A, 1940
- Elektrische Untersuchungen an oxydischen HalbleiternThe European Physical Journal A, 1936