Chemical vapor deposition of doped TiO2 thin films
- 1 March 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 147 (2) , 167-176
- https://doi.org/10.1016/0040-6090(87)90282-3
Abstract
No abstract availableKeywords
This publication has 24 references indexed in Scilit:
- A simple chemical vapour deposition method for depositing thin TiO2 filmsThin Solid Films, 1983
- Chemical vapour deposition of TiO2 film using an organometallic process and its photoelectrochemical behaviourJournal of the Chemical Society, Faraday Transactions 1: Physical Chemistry in Condensed Phases, 1981
- Hydrogen in TiO2 PhotoanodesJournal of the Electrochemical Society, 1979
- Chemical vapour deposition of rutile filmsJournal of Crystal Growth, 1976
- Dehydration of Alcohols on Aluminum OxideAngewandte Chemie International Edition in English, 1968
- Vapor Deposition of TiO2Japanese Journal of Applied Physics, 1968
- Dependence of the Electrical Conductivity and Thermoelectric Power of Pure and Aluminum-Doped Rutile on Equilibrium Oxygen Pressure and TemperaturePhysical Review B, 1963
- Protons, dipoles, and charge carriers in rutile in rutileJournal of Physics and Chemistry of Solids, 1962
- Electrical Properties of Titanium Dioxide SemiconductorsPhysical Review B, 1953
- Influence of Impurities on Electrical Conductivity of RutileJournal of the American Ceramic Society, 1953