Computer-controlled four-gun multisubstrate sputtering system for the preparation of composition-modulated structures

Abstract
We describe a four-gun sputtering system which has been used successfully to prepare composition-modulated structures consisting of amorphous semiconductors and superconducting alloys or binary compounds. The substrates are mounted in ovens which can be individually heated to over 1000 °C. The ovens are mounted on a wheel which is driven by a computer-controlled stepping motor. With appropriate programming of the movement of the stepping motor, the deposition sequence is determined.