Interest of Pulsed and Modulated dc Discharges for Depositing Insulating Compounds by Reactive Magnetron Sputtering

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Abstract
Reactive magnetron sputtering using dc discharges simultaneously pulsed at medium-frequency (a few tenths of kHz) and modulated at low-frequency (a few Hz) enables the deposition of insulating ceramic films with a high growth rate and an excellent physical quality. The medium-frequency pulses and the low-frequency modulation respectively favour the long time stability of the electric conditions (suppression of arcing) and of the sputtering process itself (dynamic control of the target poisoning by the reactive gas)

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