Wide band gap silicon carbon nitride films deposited by electron cyclotron resonance plasma chemical vapor deposition
- 1 November 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 355-356, 205-209
- https://doi.org/10.1016/s0040-6090(99)00486-1
Abstract
No abstract availableKeywords
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