Electrical resistivity due to interstitial hydrogen and deuterium in V, Nb, Ta and Pd
- 1 August 1980
- journal article
- Published by IOP Publishing in Journal of Physics F: Metal Physics
- Vol. 10 (8) , 1795-1801
- https://doi.org/10.1088/0305-4608/10/8/016
Abstract
The resistivity due to hydrogen and deuterium in V, Nb, Ta and Pd has been measured as a function of concentration, temperature and isotopes. The measurements were performed at temperatures in the ranges 120-670 degrees C for V, 120-720 degrees C for Nb, and 120-770 degrees C for Ta, and at 170 degrees C for Pd, and in the concentration ranges of 0-0.1 atomic ratios for V, Nb and Ta and 0-0.02 atomic ratios for Pd in the alpha -phase. Within the ranges of concentration investigated, the resistivity due to H(D) in these metals increases linearly with H (D) concentration. The values are found to be almost independent of temperature for V, Nb and Ta. Values of the resistivity increase due to one atomic per cent of H (D) are V: 0.85+or-0.02 (H), 0.83+or-0.02 (D); Nb:0.63+or-0.01 (H), 0.62+or-0.01 (D); Ta: 0.71+or-0.01 (H), 0.71+or-0.01 (D); Pd: 0.68+or-0.05 (H), 0.62+or-0.05 (D); all values are in mu Omega cm.Keywords
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