Surface-state density and surface potential in MIS capacitors by surface photovoltage measurements. II
- 1 September 1971
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 4 (9) , 1376-1389
- https://doi.org/10.1088/0022-3727/4/9/319
Abstract
This paper describes a surface photovoltage method which is complementary to the one reported in part I. The present method relies on the fact that a change in illumination level causes a change in electron occupancy of some of the surface states. It involves only moderate light intensity and yields results for the surface-state density from the slope of the surface-photovoltage against log-of-light-intensity curve. The limits of surface potential within which the method is valid as well as the range of surface-state densities measurable will be examined. Results are presented and are compared with those obtained by other methods. The possible advantage in measurements at low temperatures is also discussed.Keywords
This publication has 8 references indexed in Scilit:
- ENERGY DEPENDENCE OF ELECTRICAL PROPERTIES OF INTERFACE STATES IN Si–SiO2 INTERFACESApplied Physics Letters, 1970
- Interface studies of the m.i.s. structure by surface photovoltage measurementsElectronics Letters, 1970
- The Si-SiO2Interface - Electrical Properties as Determined by the Metal-Insulator-Silicon Conductance TechniqueBell System Technical Journal, 1967
- Re-analysis of the temperature dependence of surface conductance in clean germaniumSurface Science, 1966
- DENSITY OF SiO2–Si INTERFACE STATESApplied Physics Letters, 1966
- Photo-voltage induced by capture of photo-carriers by surface traps: Surface photo-voltage on silicon under flat band conditionsSurface Science, 1965
- Investigation of thermally oxidised silicon surfaces using metal-oxide-semiconductor structuresSolid-State Electronics, 1965
- Large-Signal Surface Photovoltage Studies with GermaniumPhysical Review B, 1958