Pilot production of half-micron x-ray masks
- 1 November 1989
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 7 (6) , 1570-1574
- https://doi.org/10.1116/1.584491
Abstract
The key specifications for 0.5-μ x-ray mask have been achieved in a pilot production operation. A poly(butene-1-sulfane) (PBS), Cr patterning process has been used as the top layers of a trilevel stencil in which to plate the opaque gold absorber. The following specifications were exceeded: registration <0.08 μ (3 σ), linewidth control <0.06 μ (3 σ), and defect density <20/cm2.Keywords
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