25.2: Simple Process of Hillock-Free Al-Gate Metallization without ITO/Al Contact Problems for Large-Area TFT-LCDs

Publisher Website

1 January 1998

journal article
Published by Wiley in SID Symposium Digest of Technical Papers

Vol. 29 (1) , 375
https://doi.org/10.1889/1.1833770

Abstract

No abstract available

Keywords

This publication has 1 reference indexed in Scilit:

Characteristics of a-Si:H Schottky Photodiode by Using Mo Barrier Metal at Al/ITO Contact
MRS Proceedings, 1991