CMOS membrane infrared sensors and improved TMAHW etchant

17 December 2002

conference paper
Published by Institute of Electrical and Electronics Engineers (IEEE)

No. 01631918,p. 531-534
https://doi.org/10.1109/iedm.1994.383352

Abstract

We report the design and fabrication of thermoelectric infrared sensors realized using industrial CMOS IC technologies combined with a subsequent anisotropic etching step. Back etched two-element sensors together with on-chip low-noise operational amplifiers for an intrusion alarm are presented. The etch characteristics of an improved TMAHW (tetramethyl ammonium-hydroxide water) etching solution which could be used instead of KOH are also described.

Keywords

BIOMEMBRANES
INFRARED SENSORS
ETCHING
CMOS TECHNOLOGY
FABRICATION
THERMOELECTRICITY
TEXTILE INDUSTRY
CMOS INTEGRATED CIRCUITS
ANISOTROPIC MAGNETORESISTANCE
SENSOR PHENOMENA AND CHARACTERIZATION

This publication has 1 reference indexed in Scilit:

Low noise multirate SC read-out circuitry for thermoelectric integrated infrared sensors
Published by Institute of Electrical and Electronics Engineers (IEEE) ,2002