Nanometer sidewall lithography by resist silylation

• 1 November 1989
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B
• Vol. 7  (6) , 1756-1759
• https://doi.org/10.1116/1.584452

Abstract

Keywords

• RESIST SILYLATION
• NANOMETER SIDEWALL LITHOGRAPHY
• LITHOGRAPHY BY RESIST