Photoconductivity and optical stability of intrinsic μc-Si films formed by remote plasma-enhanced chemical-vapor deposition, remote pecvd
- 1 January 1991
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 137-138, 737-740
- https://doi.org/10.1016/s0022-3093(05)80226-1
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Deposition of μc-Si and μc-SiC thin films by remote plasma-enhanced chemical-vapor depositionSolar Cells, 1991
- The preparation of microcrystalline silicon (μc-Si) thin films by remote plasma-enhanced chemical vapor depositionJournal of Vacuum Science & Technology A, 1991
- Some new results on transport and density of state distribution in glow discharge microcrystalline siliconJournal of Non-Crystalline Solids, 1983