Influence of Adsorbed Gas on Surface Diffusion and Nucleation
- 1 January 1966
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 37 (1) , 275-279
- https://doi.org/10.1063/1.1707825
Abstract
Experiments with the field-electron emission microscope show that residual gas pressures as low as 2×10−8 Torr increase the density of nucleation of copper on tungsten compared with the nucleation density at 4×10−10 Torr ambient pressure. The effect of adsorbed oxygen and nitrogen on the mobility of copper on tungsten depends on the relative amounts of gas and copper and on the local substrate crystallography. Generally stated, they increase the activation energy for surface diffusion.This publication has 9 references indexed in Scilit:
- Adsorption and Surface Diffusion of Copper on TungstenThe Journal of Chemical Physics, 1965
- Field emission from epitaxially grown yttrium on tungstenJournal of the Less Common Metals, 1965
- Epitaxial Growth of Cu on W Field EmittersThe Journal of Chemical Physics, 1963
- Nucleation of Vapor DepositsThe Journal of Chemical Physics, 1962
- Molecular Dissociation and Reconstitution on SolidsThe Journal of Chemical Physics, 1959
- Structure-sensitive chemisorption: The mechanism of desorption from tungstenJournal of Physics and Chemistry of Solids, 1958
- THE LIFE HISTORY OF ADSORBED ATOMS, IONS, AND MOLECULESAnnals of the New York Academy of Sciences, 1954
- The Stability of Gaseous Diatomic OxidesThe Journal of Chemical Physics, 1951
- Oberflächenwanderung von Wolfram auf dem eigenen KristallgitterThe European Physical Journal A, 1949