Photolysis of tetramethylsilane at 147 nm. Reactiviy of trimethylsilyl and (dimethylsilyl)methylene
- 1 April 1979
- journal article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry
- Vol. 83 (7) , 774-778
- https://doi.org/10.1021/j100470a002
Abstract
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