Tantalum thin film microcircuits—Fabrication techniques and component characteristics
- 1 August 1963
- journal article
- Published by Elsevier in Microelectronics Reliability
- Vol. 2 (2) , 99-105
- https://doi.org/10.1016/0026-2714(63)90191-4
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Temperature Coefficients of Resistance of Metallic Films in the Temperature Range 25° to 600°CJournal of Applied Physics, 1959