Transverse electron guns for plasma excitation
- 1 July 1982
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 53 (7) , 4704-4710
- https://doi.org/10.1063/1.331298
Abstract
We report a plasma gun, which generates on a continuous basis, kilowatt electron beam discharges (e.g., 0.4 A at 4 kV) in an ambient pressure 0.1–1 Torr without differential pumping. Gun design characteristics, operating parameters, and measured beam profiles are given. Electron beam generation on a pulsed basis has also been studied. More than 100 A of beam current has been measured with a Faraday cup biased to −100V. A trapped electron beam scheme for achieving efficient deposition of the electron beam energy in a gas medium is described.This publication has 1 reference indexed in Scilit:
- Plasma annealing of ion implanted semiconductorsApplied Physics Letters, 1981