Effect of Temperature on Diffraction Efficiency of Holograms Recorded in Arsenic Trisulphide Thin Films
- 1 October 1984
- journal article
- research article
- Published by Taylor & Francis in Optica Acta: International Journal of Optics
- Vol. 31 (10) , 1161-1165
- https://doi.org/10.1080/713821423
Abstract
Hologram recording in arsenic trisulphide thin films of thickness 300 nm, prepared by electron beam evaporation on substrates between room temperature and 150°C, have been investigated experimentally. These holograms were evaluated for the diffraction efficiency (DE) and resolution. The results were compared with published results for As2 S3 films prepared in gelatin. The DE was investigated for beam ratios of 1, 5 and 10, and was found to decrease for increasing temperature and beam ratio. Thus decrease in DE at an elevated substrate temperature (150°C) is attributed to microstructural changes taking place in the As2 S3 films.Keywords
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