Effect of hydrogen on hot electron energy relaxation in SiO2 and Si3N4 films
- 10 December 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 221 (1-2) , 160-165
- https://doi.org/10.1016/0040-6090(92)90810-x
Abstract
No abstract availableKeywords
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