Measurement of High-Frequency Dielectric Characteristics in the mm-Wave Band for Dielectric Thin Films on Semiconductor Substrates
- 1 September 1995
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 34 (9B) , L1211-1213
- https://doi.org/10.1143/jjap.34.l1211
Abstract
Using dielectric thin film capacitors and devices specially designed for correcting stray effect around the capacitors, the dielectric constant and dielectric loss up to 50 GHz can be successfully measured by the reflection coefficient measured with a network analyzer. The high-frequency characteristics are consistent with low-frequency characteristics measured with an LCR bridge. The relative error between the high-frequency and the low-frequency is estimated to be within 10%. The method is a practical way to obtain the characteristics of dielectric thin films accurately and quickly in final form.Keywords
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