Kinetics of the reactions of SiH3 with O2 and N2O
- 1 August 1988
- journal article
- Published by Elsevier in Chemical Physics Letters
- Vol. 149 (2) , 180-184
- https://doi.org/10.1016/0009-2614(88)87218-x
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- Mechanistic Studies of Chemical Vapor DepositionAnnual Review of Physical Chemistry, 1987
- Vibrational distributions and rate constants from reactions of oxygen atoms with HI, GeH4, SiH4, H2Se, and H2SThe Journal of Chemical Physics, 1987
- Stoichiometry and possible mechanism of SiH4O2 explosionsCombustion and Flame, 1987
- Kinetics of the reactions of methyl, ethyl, isopropyl, and tert-butyl radicals with molecular chlorineThe Journal of Physical Chemistry, 1986
- Mono- and disilicon radicals in silane and silane-argon dc dischargesJournal of Applied Physics, 1986
- Kinetics of polyatomic free radicals produced by laser photolysis. 5. Study of the equilibrium methyl + oxygen .dblarw. CH3O2 between 421 and 538.degree.Journal of the American Chemical Society, 1985
- An FTIR study of the kinetics and mechanism for the chlorine- and bromine-atomic-initiated oxidation of silaneThe Journal of Physical Chemistry, 1985
- The time-resolved LMR method as used to measure elementary reaction rates of CI atoms and SiH3 radicals in pulse photolysis of S2Cl2 in the presence of SiH4Chemical Physics, 1984
- Rates of reaction of propyl radicals with molecular oxygenThe Journal of Physical Chemistry, 1984
- Radical species in argon-silane dischargesApplied Physics Letters, 1983