A 'Model-on-Demand' identification methodology for non-linear process systems
- 1 January 2001
- journal article
- research article
- Published by Taylor & Francis in International Journal of Control
- Vol. 74 (18) , 1708-1717
- https://doi.org/10.1080/00207170110089734
Abstract
An identification methodology based on multi-level pseudo-random sequence (multi-level PRS) input signals and 'Model-on-Demand' (MoD) estimation is presented for single-input, single-output non-linear process applications. 'Model-on-Demand' estimation allows for accurate prediction of non-linear systems while requiring few user choices and without solving a non-convex optimization problem, as is usually the case with global modelling techniques. By allowing the user to incorporate a priori information into the specification of design variables for multi-level PRS input signals, a sufficiently informative input-output dataset for MoD estimation is generated in a 'plant-friendly' manner. The usefulness of the methodology is demonstrated in case studies involving the identification of a simulated rapid thermal processing (RTP) reactor and a pilot-scale brine-water mixing tank. On the resulting datasets, MoD estimation displays performance comparable to that achieved via semi-physical modelling and semi-physical modelling combined with neural networks. The MoD estimator, however, achieves this level of performance with substantially lower engineering effort.Keywords
This publication has 6 references indexed in Scilit:
- Just in time models for dynamical systemsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- On adaptive smoothing of empirical transfer function estimatesControl Engineering Practice, 2000
- Plant-friendly identification of second-order Volterra modelsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1999
- System identification with multi-level periodic perturbation signalsControl Engineering Practice, 1999
- Comparison of global nonlinear models and "model-on-demand" estimation applied to identification of a RTP wafer reactorPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1999
- RTP temperature control requirement for submicron device fabricationPublished by SPIE-Intl Soc Optical Eng ,1993