On the thermal oxidation of titanium-implanted copper films
- 1 December 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 110 (3) , 237-240
- https://doi.org/10.1016/0040-6090(83)90241-9
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Depth profiling by ion-beam spectrometryApplied Physics A, 1982
- Corrosion inhibition by ion implantation of Al or Mg in Cu, investigated by RBSNuclear Instruments and Methods in Physics Research, 1981
- The alteration of oxidation and related properties of metals by ion implantationNuclear Instruments and Methods, 1981
- A comparison of the corrosion protection of copper by ion implantation of Al and CrCorrosion Science, 1980
- The influence of ion implantation on the thermal oxidation of copperJournal of Physics F: Metal Physics, 1978