Bombardment energies of O2+ in low pressure reactive ion etching
- 20 July 1992
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 61 (3) , 261-263
- https://doi.org/10.1063/1.107963
Abstract
Quadrupole mass spectroscopy has been used to resolve the energy distributions of O2+ on the substrate plane of a parallel plate reactive ion etching reactor. Energy spectra show pronounced structures caused by charge exchange collisions in the plasma sheath in combination with rf modulation. Additionally, continuous distributions are found which are attributed to the effect of elastic scattering of ions.Keywords
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