Precision Measurements Of Material-Removal Rates In Superpolishing Sapphire
- 11 April 1989
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- Vol. 1015, 114-123
- https://doi.org/10.1117/12.949456
Abstract
As we demonstrate, sapphire can be polished by means of colloidal SiO2 (7 nmφ) in water by direct contact to a tin lap to a residual roughness better than 0.3 nm Rz measured with a Talystep profilometer. We use the superpolishing mechanism itself for producing microscopically smooth grooves which can serve for a precision measurement of the very small removal rates intrinsic to the superpolishing process. In order to explain the superpolishing process, we propose the model of hydrothermal wear.Keywords
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