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Structure modification of radio frequency sputtered LaB6 thin films by internal stress
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Structure modification of radio frequency sputtered LaB6 thin films by internal stress
Structure modification of radio frequency sputtered LaB6 thin films by internal stress
TN
T. Nakano
T. Nakano
SB
S. Baba
S. Baba
AK
A. Kobayashi
A. Kobayashi
AK
A. Kinbara
A. Kinbara
TK
T. Kajiwara
T. Kajiwara
KW
K. Watanabe
K. Watanabe
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1 May 1991
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology A
Vol. 9
(3)
,
547-549
https://doi.org/10.1116/1.577406
Abstract
No abstract available
Keywords
SURFACE ENERGY
PHYSICAL PROPERTIES
RADIO FREQUENCY
THIN FILM
FREE ENERGY
STRAIN ENERGY
LOW PRESSURE
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