Centimeter scale atomic force microscope imaging and lithography
- 21 September 1998
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 73 (12) , 1742-1744
- https://doi.org/10.1063/1.122263
Abstract
Cataloged from PDF version of article.We present a 4 mm2 image taken with a parallel array of 10 cantilevers, an image spanning 6.4 mm taken with 32 cantilevers, and lithography over a 100 mm2 area using an array of 50 cantilevers. All of these results represent scan areas that are orders of magnitude larger than that of a typical atomic force microscope (0.01 mm2). Previously, the serial nature and limited scan size of the atomic force microscope prevented large scale imaging. Our design addresses these issues by using a modular micromachined parallel atomic force microscope array in conjunction with large displacement scanners. High-resolution microscopy and lithography over large areas are important for many applications, but especially in microelectronics, where integrated circuit chips typically have nanometer scale features distributed over square centimeter areas.\ud © 1998 American Institute of PhysicsKeywords
This publication has 10 references indexed in Scilit:
- Automated parallel high-speed atomic force microscopyApplied Physics Letters, 1998
- Sequential position readout from arrays of micromechanical cantilever sensorsApplied Physics Letters, 1998
- On Some Modern Uses of the Electron in Logic and MemoryPhysics Today, 1997
- 6-MHz 2-N/m piezoresistive atomic-force microscope cantilevers with INCISIVE tipsJournal of Microelectromechanical Systems, 1997
- Interdigital cantilevers for atomic force microscopyApplied Physics Letters, 1996
- Low-stiffness silicon cantilevers for thermal writing and piezoresistive readback with the atomic force microscopeApplied Physics Letters, 1996
- Independent parallel lithography using the atomic force microscopeJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- AFM Fabrication of Sub-10-Nanometer Metal-Oxide Devices with in Situ Control of Electrical PropertiesScience, 1995
- Nanometer scale lithography at high scanning speeds with the atomic force microscope using spin on glassApplied Physics Letters, 1995
- Fabrication of 0.1 μm metal oxide semiconductor field-effect transistors with the atomic force microscopeApplied Physics Letters, 1995