The evaluation of radio-frequency sputtering as a microsectioning technique for the tracer diffusion studies in oxides
- 1 November 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 46 (3) , 291-298
- https://doi.org/10.1016/0040-6090(77)90185-7
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Sputtering in the surface analysis of solids: A discussion of some problemsJournal of Vacuum Science and Technology, 1976
- Sputter sectioning of diffusion specimensJournal of Vacuum Science and Technology, 1976
- Grain‐Boundary Diffusion of U in Pure and Doped Uranium Carbides with Different C/U RatiosJournal of the American Ceramic Society, 1975
- On the direct measurement of diffusion at temperatures less than 0.5 TmThin Solid Films, 1975
- Grain boundary self-diffusion in evaporated Au films at low temperaturesThin Solid Films, 1974
- Grain-boundary self-diffusion in Au by Ar sputtering techniqueJournal of Applied Physics, 1973
- A UNIVERSAL MICROSECTIONING TECHNIQUE FOR DIFFUSIONApplied Physics Letters, 1970
- R.F. sputteringThin Solid Films, 1970
- The role of structural defects in the growth of nickel oxide filmsActa Metallurgica, 1968
- The Measurement of Ionic Mobilities in the Anodic Oxides of Tantalum and Zirconium by a Precision Sectioning TechniqueJournal of the Electrochemical Society, 1968