Low temperature chemical vapor deposition of TaB2
- 1 October 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 72 (3) , 517-522
- https://doi.org/10.1016/0040-6090(80)90541-6
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Chemical vapour deposition of tantalum diborideJournal of Materials Science, 1979
- Boriding with a thermally unstable gas (diborane)Metallurgical Transactions A, 1979
- Chemical vapor deposited borides of the form (Ti,Zr)B2 and (Ta,Ti)B2Thin Solid Films, 1979
- Chemical Vapor Deposition of NbB2 and TaB2 through Heating by Concentration of Solar RadiationJournal of the Electrochemical Society, 1976