Field emission deposition sources
- 1 March 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 58 (1) , 129-132
- https://doi.org/10.1016/0040-6090(79)90224-4
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Molecular beam epitaxy and field emission deposition for metal film growth on III–V compound semiconductors—A comparative studyThin Solid Films, 1979
- Ionized-cluster beam deposition and epitaxyThin Solid Films, 1979
- Miniature ion sources for analytical instrumentsNuclear Instruments and Methods, 1978