Effects of O 2 Feed Gas Impurity on Cl2 Based Plasma Etching of Polysilicon

• 1 January 1992
• journal article
• Published by The Electrochemical Society in Journal of the Electrochemical Society
• Vol. 139  (1) , 250-256
• https://doi.org/10.1149/1.2069179

Abstract

Keywords

• PLASMA ETCHING