Plasma‐Enhanced Chemical Vapor Deposition of Silicon Dioxide Using Tetraethylorthosilicate (TEOS)
- 1 November 1989
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 136 (11) , 3404-3408
- https://doi.org/10.1149/1.2096461
Abstract
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