Silicon surfaces treated by CF4, CF4/H2, and CF4/O2 rf plasmas: Study by in situ Fourier transform infrared ellipsometry
- 1 March 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 15 (2) , 209-215
- https://doi.org/10.1116/1.580514
Abstract
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