A resistance monitor with power cut‐off for automatic regulation of shadow and support film thickness in freeze‐etching and related techniques
- 1 December 1977
- journal article
- research article
- Published by Wiley in Journal of Microscopy
- Vol. 111 (3) , 313-328
- https://doi.org/10.1111/j.1365-2818.1977.tb00071.x
Abstract
A resistance monitor with sensors and automatic power cut-off wad developed to control the thickness of Pt-C shadow and C replica films in freeze-etching and related techniques [used in EM]. The monitor and sensors, in conjunction with newly modified evaporators, should considerably reduce the amount of C and Pt required and should prove useful in other applications employing vacuum evaporation of thin films of Pt, C or other conducting materials.This publication has 15 references indexed in Scilit:
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