Aluminum chemical vapor deposition with new gas phase pretreatment using tetrakisdimethylamino-titanium for ultralarge-scale integrated-circuit metallization
- 1 September 1995
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 13 (5) , 2115-2118
- https://doi.org/10.1116/1.588085
Abstract
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