Excimer-laser-induced etching of ceramic PbTi1−xZrxO3
- 15 August 1987
- journal article
- letter
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 62 (4) , 1511-1514
- https://doi.org/10.1063/1.339613
Abstract
The etching of ceramic PbTi1−xZrxO3 (PZT) by XeCl excimer laser radiation has been investigated. In air, the threshold fluence for etching was about 2 J/cm2. At fluences of 10 J/cm2, etch rates of 0.1 μm/pulse were observed. The geometry of etched structures can readily be defined by choosing suitable experimental conditions, suggesting potential applications of this process to the production of devices.This publication has 4 references indexed in Scilit:
- Laser-induced surface metallization of ceramic PLZTApplied Physics A, 1986
- Laser-induced chemical etching of ceramic PbTi1?xZrxO3Applied Physics A, 1986
- Optical and photochemical factors which influence etching of polymers by ablative photodecompositionJournal of Vacuum Science & Technology B, 1985
- Kinetic effects in drilling with the CO2 laserJournal of Applied Physics, 1973