Characterization of W Films on Si and SiO2/Si Substrates by X-Ray Diffraction, AFM and Blister Test Adhesion Measurements
Open Access
- 1 January 1997
- journal article
- Published by EDP Sciences in Microscopy Microanalysis Microstructures
- Vol. 8 (4-5) , 261-272
- https://doi.org/10.1051/mmm:0199700804-5026100
Abstract
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