High-rate vapor deposition and large systems for coating processes

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Abstract
In many branches of national economies the coating of large areas at high rates is a precondition for introducing new products on the market in a profitable manner. In the field of physical vapor deposition fresh ground has been opened up by the use of high-rate electron beam (EB) evaporation for about 20 yr, and by high-rate sputtering for about 10 yr. As far as metal coating of substrates at extremely high rates is concerned, high-rate EB evaporation practically has no competitor. High-rate sputtering has gained a firm hold in the deposition of alloys and compounds on large areas. Moreover, process extensions also will increase the usability of both techniques in the years to come.

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