Efficient high-power CH3F amplifier for a 496-μm cavity laser
- 15 March 1976
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 28 (6) , 328-330
- https://doi.org/10.1063/1.88746
Abstract
A CH3F amplifier has been constructed for use with a narrow‐linewidth pulsed 496‐μm CH3F cavity laser. The power conversion ratio of the amplifier, defined as the ratio of 496‐μm power emitted to CO2 power absorbed, had a maximum value of (4.7±2.5) ×10−3 at a CH3F gas pressure of 0.1 Torr. The highest average power, 6±1 kW, was produced by the oscillator‐amplifier laser system when the amplifier was run with a CH3F gas pressure of 0.9 Torr. At this pressure the power conversion ratio of the amplifier was (1.8±1.0) ×10−3. Analysis of the gain data yields values for the small‐signal gain and saturation intensity as a function of CH3F gas pressure.Keywords
This publication has 7 references indexed in Scilit:
- Development of an efficient 9-kW 496-μm CH3F laser oscillatorApplied Physics Letters, 1975
- Pumping and emission characteristics of a 4 kW, submillimeter CH3 F laserOptics Communications, 1975
- Interaction of Intense Submillimeter Radiation with PlasmasIEEE Transactions on Microwave Theory and Techniques, 1974
- Development of Megawatt-Level Narrow-Band Far-Infrared Lasers for Plasma Diagnostics (Letters)IEEE Transactions on Microwave Theory and Techniques, 1974
- Tokamak diagnostics with the 496-μm CH3F laserNuclear Fusion, 1974
- Spatially Resolved Measurement of Impurities and the Effective Chargein a Tokamak PlasmaPhysical Review Letters, 1974
- Laser action at 452, 496, and 541 μm in optically pumped CH3FOptics Communications, 1970