Metal-containing fluoropolymer films produced by simultaneous plasma etching and polymerization: The series of perfluoroalkanes nF2n+2 (n = 1,2,3,4)
- 1 April 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 78 (4) , 309-318
- https://doi.org/10.1016/0040-6090(81)90033-x
Abstract
No abstract availableKeywords
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- Plasma etching A ’’pseudo-black-box’’ approachJournal of Applied Physics, 1977
- Direct photolysis of tetrafluoroethylene at 1849 ÅCanadian Journal of Chemistry, 1969