Low-pressure plasma cleaning: a process for precision cleaning applications
- 31 December 1997
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 97 (1-3) , 176-181
- https://doi.org/10.1016/s0257-8972(97)00143-6
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Etching behavior of an epoxy film in O2/CF4 plasmasJournal of Vacuum Science & Technology A, 1991