Study of thin chemical vapour deposited tungsten oxide films by positron annihilation spectroscopy
- 1 June 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 347 (1-2) , 302-306
- https://doi.org/10.1016/s0040-6090(99)00014-0
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Source correction in positron annihilation lifetime spectroscopyJournal of Physics: Condensed Matter, 1996
- Comments on the Paper “Can Positron Annihilation Lifetime Spectroscopy Measure the Free-Volume Hole Size Distribution in Amorphous Polymers?”Macromolecules, 1996
- ElectrochromismPublished by Wiley ,1995
- Inorganic Non-Oxide Electrochromic MaterialsPublished by Elsevier ,1995
- The influence of microstructure on the electrochromic properties of LixWO3 films: Part II. Limiting mechanisms in coloring and bleaching processesJournal of Materials Research, 1993
- Electrochromic materials: Microstructure, electronic bands, and optical propertiesApplied Physics A, 1993
- Study of optical dispersion parameters of WO3 polycrystalline thin filmsJournal of Applied Physics, 1992
- Structure and optical properties of WO3 thin films prepared by chemical vapour depositionThin Solid Films, 1987
- The temperature dependence of positron lifetimes in solid pivalic acidChemical Physics, 1981
- Chemical and electrochemical stability of WO3 electrochromic films in liquid electrolytesJournal of Electronic Materials, 1978