Diamond film deposition by downstream d.c. glow discharge plasma chemical vapour deposition
- 30 April 1994
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 3 (4-6) , 531-533
- https://doi.org/10.1016/0925-9635(94)90218-6
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Plasma-assisted CVD of diamond films by hollow cathode arc dischargeDiamond and Related Materials, 1993
- Electrical conductivity and photoluminescence of diamond films grown by downstream microwave plasma CVDJournal of Electronic Materials, 1992
- Cathodoluminescence and electroluminescence of undoped and boron-doped diamond formed by plasma chemical vapor depositionJournal of Applied Physics, 1990
- Growth of Diamond Thin Films by dc Plasma Chemical Vapor Deposition and Characteristics of the PlasmaJapanese Journal of Applied Physics, 1990