Use of Frustrated Total Internal Reflection to Measure Film Thickness and Surface Reliefs
- 1 September 1962
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 33 (9) , 2774-2775
- https://doi.org/10.1063/1.1702547
Abstract
When total internal reflection of light occurs, radiation penetrates beyond the reflecting surface into the rarer medium where the intensity decreases with distance from the interface in an exponential manner. Since the degree of coupling to this radiation can be controlled by adjusting the proximity of another object to this interface, it is possible to utilize this phenomenon in the measurement of film thickness and to obtain high contrast images of surface reliefs.This publication has 4 references indexed in Scilit:
- Optical Spectrum of the Semiconductor Surface States from Frustrated Total Internal ReflectionsPhysical Review B, 1962
- True Temperature and Brightness TemperatureJournal of the Optical Society of America, 1961
- Study of Physics and Chemistry of Surfaces from Frustrated Total Internal ReflectionsPhysical Review Letters, 1960
- Untersuchungen über die TotalreflexionAnnalen der Physik, 1910