Acid diffusion analysis in the chemically amplified CARL resist
- 30 June 2000
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 53 (1-4) , 479-483
- https://doi.org/10.1016/s0167-9317(00)00360-9
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Effect of Acid Diffusion on Resolution of a Chemically Amplified Resist in X-Ray LithographyJapanese Journal of Applied Physics, 1991